Holographic illuminator for synchrotron-based projection lithography systems
Abstract
The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175458
- Patent Number(s):
- 6927887
- Application Number:
- 09/981,500
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Naulleau, Patrick P. Holographic illuminator for synchrotron-based projection lithography systems. United States: N. p., 2005.
Web.
Naulleau, Patrick P. Holographic illuminator for synchrotron-based projection lithography systems. United States.
Naulleau, Patrick P. Tue .
"Holographic illuminator for synchrotron-based projection lithography systems". United States. https://www.osti.gov/servlets/purl/1175458.
@article{osti_1175458,
title = {Holographic illuminator for synchrotron-based projection lithography systems},
author = {Naulleau, Patrick P.},
abstractNote = {The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 09 00:00:00 EDT 2005},
month = {Tue Aug 09 00:00:00 EDT 2005}
}
Works referenced in this record:
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998
- Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings
Modification of the coherence of undulator radiation
journal, February 1995
- White, D. L.; Wood, O. R.; Bjorkholm, J. E.
- Review of Scientific Instruments, Vol. 66, Issue 2