Method to fabricate layered material compositions
Abstract
A new class of processes suited to the fabrication of layered material compositions is disclosed. Layered material compositions are typically three-dimensional structures which can be decomposed into a stack of structured layers. The best known examples are the photonic lattices. The present invention combines the characteristic features of photolithography and chemical-mechanical polishing to permit the direct and facile fabrication of, e.g., photonic lattices having photonic bandgaps in the 0.1-20.mu. spectral range.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1175114
- Patent Number(s):
- 6812482
- Application Number:
- 09/941,820
- Assignee:
- Sandia Corporation
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Fleming, James G., and Lin, Shawn-Yu. Method to fabricate layered material compositions. United States: N. p., 2004.
Web.
Fleming, James G., & Lin, Shawn-Yu. Method to fabricate layered material compositions. United States.
Fleming, James G., and Lin, Shawn-Yu. Tue .
"Method to fabricate layered material compositions". United States. https://www.osti.gov/servlets/purl/1175114.
@article{osti_1175114,
title = {Method to fabricate layered material compositions},
author = {Fleming, James G. and Lin, Shawn-Yu},
abstractNote = {A new class of processes suited to the fabrication of layered material compositions is disclosed. Layered material compositions are typically three-dimensional structures which can be decomposed into a stack of structured layers. The best known examples are the photonic lattices. The present invention combines the characteristic features of photolithography and chemical-mechanical polishing to permit the direct and facile fabrication of, e.g., photonic lattices having photonic bandgaps in the 0.1-20.mu. spectral range.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 02 00:00:00 EST 2004},
month = {Tue Nov 02 00:00:00 EST 2004}
}
Works referenced in this record:
Photonic Band Calculations for Woodpile Structures
journal, February 1994
- Sözüer, H. S.; Dowling, Jonathan P.
- Journal of Modern Optics, Vol. 41, Issue 2