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Title: Process for manufacture of semipermeable silicon nitride membranes

Abstract

A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.

Inventors:
; ;
Issue Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174616
Patent Number(s):
6660648
Application Number:
09/678,418
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81B - MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Galambos, Paul Charles, Shul, Randy J., and Willison, Christi Gober. Process for manufacture of semipermeable silicon nitride membranes. United States: N. p., 2003. Web.
Galambos, Paul Charles, Shul, Randy J., & Willison, Christi Gober. Process for manufacture of semipermeable silicon nitride membranes. United States.
Galambos, Paul Charles, Shul, Randy J., and Willison, Christi Gober. Tue . "Process for manufacture of semipermeable silicon nitride membranes". United States. https://www.osti.gov/servlets/purl/1174616.
@article{osti_1174616,
title = {Process for manufacture of semipermeable silicon nitride membranes},
author = {Galambos, Paul Charles and Shul, Randy J. and Willison, Christi Gober},
abstractNote = {A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 09 00:00:00 EST 2003},
month = {Tue Dec 09 00:00:00 EST 2003}
}