System configured for applying multiple modifying agents to a substrate
Abstract
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.
- Inventors:
- Issue Date:
- Research Org.:
- Idaho National Laboratory (INL), Idaho Falls, ID (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174593
- Patent Number(s):
- 6652654
- Application Number:
- 09/671,459
- Assignee:
- Bechtel BWXT Idaho, LLC (Idaho Falls, ID)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
- DOE Contract Number:
- AC07-94ID13223
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., and Miller, David L. System configured for applying multiple modifying agents to a substrate. United States: N. p., 2003.
Web.
Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., & Miller, David L. System configured for applying multiple modifying agents to a substrate. United States.
Propp, W. Alan, Argyle, Mark D., Janikowski, Stuart K., Fox, Robert V., Toth, William J., Ginosar, Daniel M., Allen, Charles A., and Miller, David L. Tue .
"System configured for applying multiple modifying agents to a substrate". United States. https://www.osti.gov/servlets/purl/1174593.
@article{osti_1174593,
title = {System configured for applying multiple modifying agents to a substrate},
author = {Propp, W. Alan and Argyle, Mark D. and Janikowski, Stuart K. and Fox, Robert V. and Toth, William J. and Ginosar, Daniel M. and Allen, Charles A. and Miller, David L.},
abstractNote = {The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 25 00:00:00 EST 2003},
month = {Tue Nov 25 00:00:00 EST 2003}
}
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