DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Semiconductor material and method for enhancing solubility of a dopant therein

Abstract

A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100.degree. C.; and for indium, a 1% tensile strain at 1100.degree. C., corresponds to an enhancement of the solubility by 200%.

Inventors:
; ; ; ; ; ; ; ; ;
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174483
Patent Number(s):
6617228
Application Number:
10/246,890
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
C - CHEMISTRY C30 - CRYSTAL GROWTH C30B - SINGLE-CRYSTAL-GROWTH
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Sadigh, Babak, Lenosky, Thomas J., Rubia, Tomas Diaz, Giles, Martin, Caturla, Maria-Jose, Ozolins, Vidvuds, Asta, Mark, Theiss, Silva, Foad, Majeed, and Quong, Andrew. Semiconductor material and method for enhancing solubility of a dopant therein. United States: N. p., 2003. Web.
Sadigh, Babak, Lenosky, Thomas J., Rubia, Tomas Diaz, Giles, Martin, Caturla, Maria-Jose, Ozolins, Vidvuds, Asta, Mark, Theiss, Silva, Foad, Majeed, & Quong, Andrew. Semiconductor material and method for enhancing solubility of a dopant therein. United States.
Sadigh, Babak, Lenosky, Thomas J., Rubia, Tomas Diaz, Giles, Martin, Caturla, Maria-Jose, Ozolins, Vidvuds, Asta, Mark, Theiss, Silva, Foad, Majeed, and Quong, Andrew. Tue . "Semiconductor material and method for enhancing solubility of a dopant therein". United States. https://www.osti.gov/servlets/purl/1174483.
@article{osti_1174483,
title = {Semiconductor material and method for enhancing solubility of a dopant therein},
author = {Sadigh, Babak and Lenosky, Thomas J. and Rubia, Tomas Diaz and Giles, Martin and Caturla, Maria-Jose and Ozolins, Vidvuds and Asta, Mark and Theiss, Silva and Foad, Majeed and Quong, Andrew},
abstractNote = {A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100.degree. C.; and for indium, a 1% tensile strain at 1100.degree. C., corresponds to an enhancement of the solubility by 200%.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 09 00:00:00 EDT 2003},
month = {Tue Sep 09 00:00:00 EDT 2003}
}