Fast electron microscopy via compressive sensing
Abstract
Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1165123
- Patent Number(s):
- 8907280
- Application Number:
- 13/622,943
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2012 Sep 19
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States: N. p., 2014.
Web.
Larson, Kurt W, Anderson, Hyrum S, & Wheeler, Jason W. Fast electron microscopy via compressive sensing. United States.
Larson, Kurt W, Anderson, Hyrum S, and Wheeler, Jason W. Tue .
"Fast electron microscopy via compressive sensing". United States. https://www.osti.gov/servlets/purl/1165123.
@article{osti_1165123,
title = {Fast electron microscopy via compressive sensing},
author = {Larson, Kurt W and Anderson, Hyrum S and Wheeler, Jason W},
abstractNote = {Various technologies described herein pertain to compressive sensing electron microscopy. A compressive sensing electron microscope includes a multi-beam generator and a detector. The multi-beam generator emits a sequence of electron patterns over time. Each of the electron patterns can include a plurality of electron beams, where the plurality of electron beams is configured to impart a spatially varying electron density on a sample. Further, the spatially varying electron density varies between each of the electron patterns in the sequence. Moreover, the detector collects signals respectively corresponding to interactions between the sample and each of the electron patterns in the sequence.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 09 00:00:00 EST 2014},
month = {Tue Dec 09 00:00:00 EST 2014}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Pattern inspection apparatus and electron beam apparatus
patent, September 1996
- Honjo, Ichiro; Sugishima, Kenji; Yamabe, Masaki
- US Patent Document 5,557,105
Electron beam microscope using electron beam patterns
patent, December 1999
- Baum, Aaron W.
- US Patent Document 6,005,247
Multi-beam multi-column electron beam inspection system
patent, December 2005
- Yin, Edward; Brodie, Alan D.; Parker, N. William
- US Patent Document 6,977,375
Method for maskless particle-beam exposure
patent, August 2010
- Fragner, Heinrich; Platzgummer, Elmar
- US Patent Document 7,777,201
Method for maskless particle-beam exposure
patent, February 2012
- Platzgummer, Elmar
- US Patent Document 8,115,183
Method and apparatus for compressive imaging device
patent, June 2012
- Baraniuk, Richard G.; Baron, Dror Z.; Duarte, Marco F.
- US Patent Document 8,199,244
Method and Apparatus for Compressive Imaging Device
patent-application, October 2006
- Baraniuk, Richard G.; Baron, Dror Z.; Duarte, Marco F.
- US Patent Application 11/379688; 20060239336
Decreasing Image Acquisition Time for Compressive Imaging Devices
patent-application, February 2012
- Kelly, Kevin; Baraniuk, Richard; McMackin, Lenore
- US Patent Application 13/197304; 20120038786
Lithography System and Method of Processing Substrates in Such a Lithography System
patent-application, July 2012
- De Boer, Guido; De Jong, Hendrik Jan; Kuiper, Vincent Sylvester
- US Patent Application 13/323950; 20120175527
Compressed sensing
journal, April 2006
- Donoho, D. L.
- IEEE Transactions on Information Theory, Vol. 52, Issue 4
Computational Methods for Sparse Solution of Linear Inverse Problems
journal, June 2010
- Tropp, Joel A.; Wright, Stephen J.
- Proceedings of the IEEE, Vol. 98, Issue 6
eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology
conference, September 2010
- Platzgummer, Elmar; Cernusca, Stefan; Klein, Christof
- SPIE Photomask Technology, SPIE Proceedings
Practical compressive sensing with Toeplitz and circulant matrices
conference, July 2010
- Yin, Wotao; Morgan, Simon; Yang, Junfeng
- Visual Communications and Image Processing 2010, SPIE Proceedings
Addressable field emitter array: A tool for designing field emitters and a multibeam electron source
journal, January 2004
- Bauerdick, S.; Burkhardt, C.; Kern, D. P.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 22, Issue 6
An electromagnetically focused electron beam line source
journal, November 2003
- Iqbal, Munawar; Masood, Khalid; Rafiq, Mohammad
- Review of Scientific Instruments, Vol. 74, Issue 11
Distributed axis electron beam technology for maskless lithography and defect inspection
journal, January 2003
- Pickard, D. S.; Groves, T. R.; Meisburger, W. D.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
journal, March 2011
- Eder Kapl, Stefan; Loeschner, Hans; Piller, Walter
- Journal of Micromechanics and Microengineering, Vol. 21, Issue 4
Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
journal, November 1998
- Groves, T. R.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6
eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool
conference, October 2011
- Platzgummer, Elmar; Klein, Christof; Loeschner, Hans
- SPIE Photomask Technology, SPIE Proceedings
Secondary electron detection for distributed axis electron beam systems
journal, August 2008
- Tanimoto, S.; Pickard, D. S.; Kenney, C.
- Microelectronic Engineering, Vol. 85, Issue 8, p. 1786-1791
High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics
conference, November 2007
- Pease, R. Fabian; Pickard, Daniel S.; Tanimoto, Sayaka
- 2007 Digest of papers Microprocesses and Nanotechnology
Works referencing / citing this record:
Mathematical image assembly in a scanning-type microscope
patent, April 2017
- Poto{hacek over (c.)}ek, Pavel; Kooijman, Cornelis Sander; Slingerland, Hendrik Nicolaas
- US Patent Document 9,620,330
Reconstructing an image of a scene captured using a compressed sensing device
patent, August 2016
- Bernal, Edgar A.; Xu, Beilei; Mestha, Lalit Keshav
- US Patent Document 9,412,185