Orthogonal ion injection apparatus and process
Abstract
An orthogonal ion injection apparatus and process are described in which ions are directly injected into an ion guide orthogonal to the ion guide axis through an inlet opening located on a side of the ion guide. The end of the heated capillary is placed inside the ion guide such that the ions are directly injected into DC and RF fields inside the ion guide, which efficiently confines ions inside the ion guide. Liquid droplets created by the ionization source that are carried through the capillary into the ion guide are removed from the ion guide by a strong directional gas flow through an inlet opening on the opposite side of the ion guide. Strong DC and RF fields divert ions into the ion guide. In-guide orthogonal injection yields a noise level that is a factor of 1.5 to 2 lower than conventional inline injection known in the art. Signal intensities for low m/z ions are greater compared to convention inline injection under the same processing conditions.
- Inventors:
- Issue Date:
- Research Org.:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1129193
- Patent Number(s):
- 8698075
- Application Number:
- 13/114,869
- Assignee:
- Battelle Memorial Institute (Richland, WA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC05-76RLO1830
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011 May 24
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
Citation Formats
Kurulugama, Ruwan T, and Belov, Mikhail E. Orthogonal ion injection apparatus and process. United States: N. p., 2014.
Web.
Kurulugama, Ruwan T, & Belov, Mikhail E. Orthogonal ion injection apparatus and process. United States.
Kurulugama, Ruwan T, and Belov, Mikhail E. Tue .
"Orthogonal ion injection apparatus and process". United States. https://www.osti.gov/servlets/purl/1129193.
@article{osti_1129193,
title = {Orthogonal ion injection apparatus and process},
author = {Kurulugama, Ruwan T and Belov, Mikhail E},
abstractNote = {An orthogonal ion injection apparatus and process are described in which ions are directly injected into an ion guide orthogonal to the ion guide axis through an inlet opening located on a side of the ion guide. The end of the heated capillary is placed inside the ion guide such that the ions are directly injected into DC and RF fields inside the ion guide, which efficiently confines ions inside the ion guide. Liquid droplets created by the ionization source that are carried through the capillary into the ion guide are removed from the ion guide by a strong directional gas flow through an inlet opening on the opposite side of the ion guide. Strong DC and RF fields divert ions into the ion guide. In-guide orthogonal injection yields a noise level that is a factor of 1.5 to 2 lower than conventional inline injection known in the art. Signal intensities for low m/z ions are greater compared to convention inline injection under the same processing conditions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 15 00:00:00 EDT 2014},
month = {Tue Apr 15 00:00:00 EDT 2014}
}
Works referenced in this record:
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patent, February 1996
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- US Patent Document 5,495,108
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patent, October 2004
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patent, March 2009
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patent, April 2009
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Works referencing / citing this record:
Coaxial ion guide
patent, October 2016
- Giles, Kevin; Green, Martin Raymond; Wildgoose, Jason Lee
- US Patent Document 9,466,473