Thermochemical nanolithography components, systems, and methods
Abstract
Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.
- Inventors:
- Issue Date:
- Research Org.:
- DOESC (USDOE Office of Science (SC) (United States))
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1084067
- Patent Number(s):
- 8468611
- Application Number:
- 12/791,466
- Assignee:
- Georgia Tech Research Corporation (Atlanta, GA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G01 - MEASURING G01Q - SCANNING-PROBE TECHNIQUES OR APPARATUS
- DOE Contract Number:
- FG02-06ER46293
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., and Hua, Yueming. Thermochemical nanolithography components, systems, and methods. United States: N. p., 2013.
Web.
Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., & Hua, Yueming. Thermochemical nanolithography components, systems, and methods. United States.
Riedo, Elisa, Marder, Seth R., de Heer, Walt A., Szoskiewicz, Robert J., Kodali, Vamsi K., Jones, Simon C., Okada, Takashi, Wang, Debin, Curtis, Jennifer E., Henderson, Clifford L., and Hua, Yueming. Tue .
"Thermochemical nanolithography components, systems, and methods". United States. https://www.osti.gov/servlets/purl/1084067.
@article{osti_1084067,
title = {Thermochemical nanolithography components, systems, and methods},
author = {Riedo, Elisa and Marder, Seth R. and de Heer, Walt A. and Szoskiewicz, Robert J. and Kodali, Vamsi K. and Jones, Simon C. and Okada, Takashi and Wang, Debin and Curtis, Jennifer E. and Henderson, Clifford L. and Hua, Yueming},
abstractNote = {Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 18 00:00:00 EDT 2013},
month = {Tue Jun 18 00:00:00 EDT 2013}
}
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Polymer Pen Lithography
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High electron mobility in nickel bis(dithiolene) complexes
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Systematic Study on Experimental Conditions for Large-Scale Growth of Aligned ZnO Nanwires on Nitrides
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Nanoscale deposition of solid inks via thermal dip pen nanolithography
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Alignment and Assembly of Adsorbed Collagen Molecules Induced by Anisotropic Chemical Nanopatterns
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