Ablation of film stacks in solar cell fabrication processes
Abstract
A dielectric film stack of a solar cell is ablated using a laser. The dielectric film stack includes a layer that is absorptive in a wavelength of operation of the laser source. The laser source, which fires laser pulses at a pulse repetition rate, is configured to ablate the film stack to expose an underlying layer of material. The laser source may be configured to fire a burst of two laser pulses or a single temporally asymmetric laser pulse within a single pulse repetition to achieve complete ablation in a single step.
- Inventors:
- Issue Date:
- Research Org.:
- SunPower Corporation, San Jose, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1083912
- Patent Number(s):
- 8409902
- Application Number:
- 13/486,095
- Assignee:
- SunPower Corporation (San Jose, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B23 - MACHINE TOOLS B23K - SOLDERING OR UNSOLDERING
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- FC36-07GO17043
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Harley, Gabriel, Kim, Taeseok, and Cousins, Peter John. Ablation of film stacks in solar cell fabrication processes. United States: N. p., 2013.
Web.
Harley, Gabriel, Kim, Taeseok, & Cousins, Peter John. Ablation of film stacks in solar cell fabrication processes. United States.
Harley, Gabriel, Kim, Taeseok, and Cousins, Peter John. Tue .
"Ablation of film stacks in solar cell fabrication processes". United States. https://www.osti.gov/servlets/purl/1083912.
@article{osti_1083912,
title = {Ablation of film stacks in solar cell fabrication processes},
author = {Harley, Gabriel and Kim, Taeseok and Cousins, Peter John},
abstractNote = {A dielectric film stack of a solar cell is ablated using a laser. The dielectric film stack includes a layer that is absorptive in a wavelength of operation of the laser source. The laser source, which fires laser pulses at a pulse repetition rate, is configured to ablate the film stack to expose an underlying layer of material. The laser source may be configured to fire a burst of two laser pulses or a single temporally asymmetric laser pulse within a single pulse repetition to achieve complete ablation in a single step.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 02 00:00:00 EDT 2013},
month = {Tue Apr 02 00:00:00 EDT 2013}
}
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