Area X-ray or UV camera system for high-intensity beams
Abstract
A system in one embodiment includes a source for directing a beam of radiation at a sample; a multilayer mirror having a face oriented at an angle of less than 90 degrees from an axis of the beam from the source, the mirror reflecting at least a portion of the radiation after the beam encounters a sample; and a pixellated detector for detecting radiation reflected by the mirror. A method in a further embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample; not reflecting at least a majority of the radiation that is not diffracted by the sample; and detecting at least some of the reflected radiation. A method in yet another embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample using a multilayer mirror; and detecting at least some of the reflected radiation.
- Inventors:
-
- Livermore, CA
- (Fremont, CA), Marchesini, Stefano (Oakland, CA)
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1014517
- Patent Number(s):
- 7672430
- Application Number:
- US Patent Application 12/121,177
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Chapman, Henry N, Bajt, Sasa, Spiller, Eberhard A, and Hau-Riege, Stefan. Area X-ray or UV camera system for high-intensity beams. United States: N. p., 2010.
Web.
Chapman, Henry N, Bajt, Sasa, Spiller, Eberhard A, & Hau-Riege, Stefan. Area X-ray or UV camera system for high-intensity beams. United States.
Chapman, Henry N, Bajt, Sasa, Spiller, Eberhard A, and Hau-Riege, Stefan. Tue .
"Area X-ray or UV camera system for high-intensity beams". United States. https://www.osti.gov/servlets/purl/1014517.
@article{osti_1014517,
title = {Area X-ray or UV camera system for high-intensity beams},
author = {Chapman, Henry N and Bajt, Sasa and Spiller, Eberhard A and Hau-Riege, Stefan},
abstractNote = {A system in one embodiment includes a source for directing a beam of radiation at a sample; a multilayer mirror having a face oriented at an angle of less than 90 degrees from an axis of the beam from the source, the mirror reflecting at least a portion of the radiation after the beam encounters a sample; and a pixellated detector for detecting radiation reflected by the mirror. A method in a further embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample; not reflecting at least a majority of the radiation that is not diffracted by the sample; and detecting at least some of the reflected radiation. A method in yet another embodiment includes directing a beam of radiation at a sample; reflecting at least some of the radiation diffracted by the sample using a multilayer mirror; and detecting at least some of the reflected radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 02 00:00:00 EST 2010},
month = {Tue Mar 02 00:00:00 EST 2010}
}
Works referenced in this record:
X-ray image reconstruction from a diffraction pattern alone
journal, October 2003
- Marchesini, S.; He, H.; Chapman, H. N.
- Physical Review B, Vol. 68, Issue 14
Multilayer reflective coatings for extreme-ultraviolet lithography
conference, June 1998
- Montcalm, Claude; Bajt, Sasa; Mirkarimi, Paul B.
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings