Electric field enhancement in metallic and multilayer dielectric gratings
- Lawrence Livermore National Lab., CA (United States)
- Arizona Univ., Tucson, AZ (United States). Optical Sciences Center
Successful operation of large-scale high-power lasers, such as those in use and planned at LLNL and elsewhere, require optical elements that can withstand extremely high fluences without suffering damage. Of particular concern are gratings used for pulse compression. Laser induced damage to bulk dielectric material originates with coupling of the electric field of the radiation to bound electrons, proceeding through a succession of mechanisms that couple the electron kinetic energy to lattice energy and ultimately to macroscopic structural changes (e.g. fracture, melting, ablation, etc.). The constructive interference that is responsible for the diffractive behavior of a grating or the reflective properties of a multilayer dielectric stack can enhance the electric field above values that would occur in unstructured homogeneous material. The presence of nonuniform electric fields, resulting from diffractive coherence, has the potential to affect damage thresholds We describe aspects of LLNL work directed towards understanding the influence of dielectric structures upon damage, with particular emphasis on electric fields within multilayer dielectric stacks.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 106433
- Report Number(s):
- UCRL-JC-121128; CONF-9505264-4; ON: DE95016608; TRN: 95:021930
- Resource Relation:
- Conference: 1. annual solid-state lasers for application to inertial confinement fusion meeting, Monterey, CA (United States), 30 May - 2 Jun 1995; Other Information: PBD: 26 May 1995
- Country of Publication:
- United States
- Language:
- English
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