Direct to Digital Holography
Description/Abstract
In this Cooperative Research and Development Agreement (CRADA), Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, testing of DDH for detection of defects in High Aspect Ratio (HAR) structures, development of image processing techniques to enhance detection capabilities through the use of both phase and intensity, and development of methods for autofocus on the DDH tools.
| DOI | 10.2172/932949 |
|---|---|
| Creator/Author: | Bingham, P.R. ; Tobin, K.W. |
| Publication Date: | 2007 Sep 30 |
| OSTI Identifier: | OSTI ID: 932949 |
| Report Number(s): | C/ORNL-0560 |
| DOE Contract Number: | DE-AC05-00OR22725 |
| DOI: | 10.2172/932949 |
| Other Number(s): | TRN: US200918%%70 |
| Resource Type: | Technical Report |
| Research Org: | Oak Ridge National Laboratory (ORNL), Oak Ridge, TN |
| Sponsoring Org: | USDOE - Office of Science (SC) |
| Subject: | 99 GENERAL AND MISCELLANEOUS; ASPECT RATIO; DEFECTS; DETECTION; HOLOGRAPHY; IMAGE PROCESSING; ORNL; TESTING |
| Country of Publication: | United States |
| Language: | English |
| Format: | Size: 4.12 Mb |
| Update Date: | 2009 Oct 14 |
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