| Bibliographic Citation | |
| Full Text | 4 Mb |
|---|---|
| Title | Perpendicular giant magnetoresistance in a 0.4 {mu}m diameter multilayer sensor |
| Creator/Author | Spallas, J. ; Huai, Y., Vernon, S. [and others] |
| Publication Date | 1996 Feb 29 |
| OSTI Identifier | OSTI ID: 226400; Legacy ID: DE96009807 |
| Report Number(s) | UCRL-JC--123000; CONF-960425--7 |
| DOE Contract Number | W-7405-ENG-48 |
| Other Number(s) | Other: ON: DE96009807; TRN: TRN: 96:002812 |
| Resource Type | Conference |
| Resource Relation | Conference: 1996 IEEE international magnetics conference, Seattle, WA (United States), 9-12 Apr 1996; Other Information: PBD: 29 Feb 1996 |
| Research Org | Lawrence Livermore National Lab., CA (United States) |
| Sponsoring Org | USDOE, Washington, DC (United States) |
| Subject | 44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; MAGNETIC FLUX; MEASURING METHODS; MEASURING INSTRUMENTS; MAGNETORESISTANCE; LAYERS; FABRICATION |
| Description/Abstract | We have fabricated a novel GMR ML flux sensor that is designed to operate in the CPP mode. The GMR sensor is a 0.4 {mu}m diameter, 0.09 {mu}m high Cu-Co ML pedestal. The sensors are patterned using electron beam lithography. The Al{sub 2}O{sub 3}-TiC substrate is coated with a sputter deposited Al{sub 2}O{sub 3} film that is polished to <0.2 nm RMS roughness. Contact to the bottom of the GMR sensor is made by depositing the Cu-Co multilayers onto a smooth 0.45 {mu}m thick Mo-Si ML stack. The top contact is self-aligned to the GMR sensor. This is accomplished, in part, by CMP. The top and bottom contact layers are electrically isolated by a PECVD Si{sub 3}N{sub 4} film. The configuration of the contacts allows four point probe resistance measurements. The GMR response of these 0.4 {mu}m diameter sensors is 12%. |
| Country of Publication | United States |
| Language | English |
| Format | Medium: ED; Size: 11 p. |
| Availability | OSTI as DE96009807 To purchase this media from NTIS, click here |
| System Entry Date | 2009 Nov 06 |
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