Application of channeling techniques and high resolution transmission electron microscopy to ion-beam damaged zircon
- Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Earth and Planetary Sciences
Zircon (ZrSiO{sub 4}) samples were irradiated at 100K with 400 keV Ar{sup +} and Xe{sup +} ion beams to fluences ranging from 5 {times} 10{sup 13} to 5 {times} 10{sup 15} ions/cm{sup 2}. Rutherford backscattering spectroscopy (RBS) experiments were completed to study the dechanneling of He ions in the irradiated zircons. Cross-sections of some irradiated samples were prepared, and the zircon microstructure was examined by high-resolution transmission electron microscopy (HRTEM). At doses greater than 8 {times} 10{sup 14} ions/cm{sup 1} or 0.8 dpa (displacements per atom), RBS channeling experiments showed the presence of a disordered or amorphous layer. The electron microscopy confirmed the presence of an amorphous layer extending over a depth of 300 to 350 nm (Ar{sup +} irradiation) and 200 nm (Xe{sup +} irradiation) in agreement with the damage layer depth calculated by TRIM. At depths extending beyond the damage peak, TEM reveals an amorphous layer with ``islands`` of crystalline material of {approximately} 30 nm in size. These experiments show that RBS and TEM are complementary techniques in investigation radiation effects in irradiations of bulk ceramic.
- DOE Contract Number:
- FG03-93ER45498
- OSTI ID:
- 99457
- Report Number(s):
- CONF-941144-; ISBN 1-55899-275-8; TRN: 95:019115
- Resource Relation:
- Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 28 Nov - 9 Dec 1994; Other Information: PBD: 1995; Related Information: Is Part Of Microstructure of irradiated materials; Robertson, I.M. [ed.] [Univ. of Illinois, Urbana, IL (United States). Dept. of Materials Science and Engineering]; Rehn, L.E. [ed.] [Argonne National Lab., IL (United States). Materials Science Div.]; Zinkle, S.J. [ed.] [Oak Ridge National Lab., TN (United States). Metals and Ceramics Div.]; Phythian, W.J. [ed.] [AEA Technology-Harwell, Oxon (United Kingdom)]; PB: 588 p.; Materials Research Society symposium proceedings, Volume 373
- Country of Publication:
- United States
- Language:
- English
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