skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Growth control of stoichiometry in LaMnO3 epitaxial thin films by pulsed laser deposition

Journal Article · · Journal of Crystal Growth

We have studied structural, magnetic, and optical transport properties of LaMnO{sub 3} (LMO) thin films grown on SrTiO{sub 3}. While the stoichiometric LMO is an insulating antiferromagnet, it tends to be a ferromagnetic insulator when grown as thin films. By exploring the majority of growth parameters, we have found that the bulk-like electronic and magnetic phases can be stabilized by growing thin films under reducing atmospheres and by using more energetic laser processes. These conditions are found to reduce the La deficiency in the film resulting in the greatly improved cation stoichiometry. Since oxides are prone to reduce the oxygen content and to alter the cation ratio under such growth conditions, it suggests that the cation and oxygen stoichiometries in complex oxide thin films can be improved by properly optimizing the growth parameters.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Laboratory Directed Research and Development (LDRD) Program
DOE Contract Number:
DE-AC05-00OR22725
OSTI ID:
992530
Journal Information:
Journal of Crystal Growth, Vol. 312, Issue 20; ISSN 0022-0248
Country of Publication:
United States
Language:
English

Similar Records

Effects of oxygen-reducing atmosphere annealing on LaMnO3 epitaxial thin films
Journal Article · Thu Jan 01 00:00:00 EST 2009 · Journal of Physics D: Applied Physics · OSTI ID:992530

LaMnO3 thin films grown by using pulsed laser deposition and their simple recovery to a stoichiometric phase by annealing
Journal Article · Sat Jan 01 00:00:00 EST 2011 · Journal - Korean Physical Society · OSTI ID:992530

Self-regulated growth of LaVO{sub 3} thin films by hybrid molecular beam epitaxy
Journal Article · Mon Jun 08 00:00:00 EDT 2015 · Applied Physics Letters · OSTI ID:992530