Fabrication and characterization of a new high density Sc/Si multilayer sliced grating
State of the art soft x-ray spectroscopy techniques like Resonant Inelastic X-ray Scattering (RIXS) require diffraction gratings which can provide extremely high spectral resolution of 105-106. This problem may be addressed with a sliced multilayer grating with an ultra-high groove density (up to 50,000 mm-1) proposed in the recent publication [Voronov, D. L., Cambie, R., Feshchenko, R. M., Gullikson, E., Padmore, H. A., Vinogradov, A. V., Yashchuk, V. V., Proc. SPIE 6705, 67050E (2007)]. It has been suggested to fabricate such a grating by deposition of a soft x-ray multilayer on a substrate which is a blazed saw-tooth grating (echellette) with low groove density. Subsequent polishing applied to the coated grating removes part of the coating and forms an oblique-cut multiline structure that is a sliced multilayer grating. The resulting grating has a short-scale periodicity of lines (bilayers), which is defined by the multilayer period and the oblique-cut angle. We fabricated and tested a Sc/Si multilayer sliced grating suitable for EUV applications, which is a first prototype based on the suggested technique. In order to fabricate an echellette substrate, we used anisotropic KOH etching of a Si wafer. The etching regime was optimized to obtain smooth and flat echellette facets. A Sc/Si multilayer was deposited by dc-magnetron sputtering, and after that it was mechanically polished using a number of diamond pastes. The resulting sliced grating prototype with ~;;270 nm line period has demonstrated a dispersive ability in the 41-49 nm photon wavelength range with a diffraction efficiency of ~;;7percent for the optimized 38th order assigned to the echellette grating of 10 mu m period.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 940559
- Report Number(s):
- LBNL-126E; TRN: US200824%%86
- Resource Relation:
- Conference: SPIE Optics and Photonics 2008, Conference 7077: Advancesin X-Ray/EUV Optics and Components III, San Diego, CA, 11-13 August 2008
- Country of Publication:
- United States
- Language:
- English
Similar Records
High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments
5000 groove/mm multilayer-coated blazed grating with 33percent efficiency in the 3rd order in the EUV wavelength range
Related Subjects
DEPOSITION
DIFFRACTION
DIFFRACTION GRATINGS
EFFICIENCY
ETCHING
FABRICATION
PERIODICITY
PHOTONS
POLISHING
RESOLUTION
SCATTERING
SPUTTERING
SUBSTRATES
WAVELENGTHS
X-RAY SPECTROSCOPY
resonant inelastic X-ray scattering
high density grating
anisotropically etched silicon gratings
soft x-ray multilayers
sliced multilayer grating
spectral resolution
RIXS