Laser/plasma chemical processing of substrates
Patent
·
OSTI ID:7249380
A process for the modification of substrate surfaces is described, wherein etching or deposition at a surface occurs only in the presence of both reactive species and a directed beam of coherent light. 10 figs.
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- US 4624736; A
- Application Number:
- PPN: US 6-634001
- OSTI ID:
- 7249380
- Resource Relation:
- Patent File Date: 24 Jul 1984
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
SUBSTRATES
SURFACE FINISHING
COHERENT RADIATION
ETCHING
LASER RADIATION
PLASMA
ELECTROMAGNETIC RADIATION
RADIATIONS
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture
SUBSTRATES
SURFACE FINISHING
COHERENT RADIATION
ETCHING
LASER RADIATION
PLASMA
ELECTROMAGNETIC RADIATION
RADIATIONS
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture