Charged-particle beam optical apparatus for irradiating a specimen in a two-dimensional pattern
An improved charged-particle beam optical apparatus for the irradiation of a specimen in a two-dimensional pattern is described. First areas are unexposed to the particle beam and are surrounded at least almost entirely by second areas which are exposed to the beam. The improvement of the invention comprises a mask disposed in the path of the beam which is uniformly irradiated by the beam and has apertures disposed in an arrangement corresponding to the two-dimensional pattern. A support grid comprising a plurality of spaced-apart, parallel strip members is disposed beneath the mask and at least in engagement with the portions which correspond to the unexposed areas of the two-dimensional pattern. Deflection means laterally deflect the image of the mask and the strip members projected onto the specimen in a direction approximately perpendicular to the longitudinal axes of the strip members at least through a distance which is equal to the width of the strip members.
- Assignee:
- Siemens AG
- Patent Number(s):
- US 4021674
- OSTI ID:
- 7221989
- Resource Relation:
- Patent Priority Date: Priority date 27 Sep 1974, German, Federal Republic of (F.R. Germany)
- Country of Publication:
- United States
- Language:
- English
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