Polymers for high technology: Electronics and photonics; Proceedings of the Symposium, Anaheim, CA, Sept. 7-12, 1986
Topics discussed in this volume include the radiation chemistry of polymers, resist materials for electron and X-ray lithography, resist materials and processing for optical lithography, etch resistance of polymers in plasma environments, polymers in photonic applications and developments, high-temperature polymers for dielectric applications, polymers for electronics packaging and interconnection, and conducting polymers. Papers are presented on the primary action of ionizing radiation on condensed systems, phenolic resin-based negative electron-beam resists, soluble polysilanes in photolithography, a simulation of resist profiles for 0.5-micron photolithography at 248 nm, and the oxygen ion etching resistance of organosilicon polymers. Consideration is also given to polymer materials for optical fiber coating, polyimides in microelectronics, stress analysis of the silicon chip-plastic encapsulant interface, and band-structure calculations on polymeric chains.
- OSTI ID:
- 7202545
- Report Number(s):
- CONF-8609423-
- Resource Relation:
- Conference: Symposium on polymers for high technology: electronics and photonics, Anaheim, CA, USA, 7 Sep 1986; Related Information: ACS Symposium Series, No. 346
- Country of Publication:
- United States
- Language:
- English
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