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Title: Molecular beam epitaxy HgCdTe infrared photovoltaic detectors

Journal Article · · Optical Engineering; (United States)
OSTI ID:7173440
; ; ; ;  [1]
  1. Rockwell Science Center, Thousand Oaks, CA (United States)

The authors present p-on-n heterostructure HgCdTe photovoltaic device data that illustrate the high performance and flexibility in band-gap control of molecular beam epitaxy technology. This flexibility demonstration was performed by growing material for operation in the following cutoff wavelength ([lambda][sub co]) ranges of interest: long wavelength IR (LWIR) [[lambda][sub co](77 K) = 9 to 11 [mu]m], mid-long wavelength IR (MLWIR) [[delta][sub co](77 K) = 6.8 [mu]m], and very long wavelength IR (VLWIR) [[lambda][sub co](40 K) = 20 [mu]m]. Detailed analyses of the current-voltage characteristics of these diodes as a function of temperature show that their dark currents are diffusion limited down to 80, 50, and 30 K for the MLWIR, LWIR, and VLWIR photodiodes, respectively. In general, the R[sub 0]A device values were uniform for the three band-gap ranges when operating under diffusion-limited conditions. They confirmed this by fabricating a 64 [times] 64 LWIR ([lambda][sub co] = 10.2 [mu]m) hybrid FPA with detectivity (D[sup [star]]) operability greater than 97% when operating at 77 K. The mean D[sup [star]] value for this device was 1.4 [times] 10[sup 11] cm Hz[sup 1/2]/W and it was background limited at the tested flux of 2.18 [times] 10[sup 16] photons/cm[sup 2]s. This device was tested at higher temperatures of operation without changing background conditions, and it remained background limited up to 100 K.

OSTI ID:
7173440
Journal Information:
Optical Engineering; (United States), Vol. 33:5; ISSN 0091-3286
Country of Publication:
United States
Language:
English