skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Atomic mechanisms of fracture in silicon: Ab initio quantum molecular dynamics calculations

Miscellaneous ·
OSTI ID:7102950

The aim of this work is to understand the energetics and the atomic mechanism of cleavage in brittle fracture. The method of ab-initio molecular dynamics investigates various problems in brittle fracture. The electronic structure of stacking faults in silicon is also examined. A modified quantum molecular dynamics method is used to study hydrogen embrittlement in silicon. The surface reconstructions which occur when a parallel-sided gap opens up between the (111) planes of silicon are computed. The Haneman (2 X 1) buckled row reconstruction is found to occur at a critical gap, d[sub c], and acts as a precursor for the Pandey (2 x 1) [pi]-bonded chain reconstructed Si(111) is calculated to be 1340 erg/cm[sup 2], in good agreement with experiment. Shuffle and glide terminations are compared and found to differ in energy by 0.24 eV/(surface atom) with shuffle termination having lower energy. The interface band gap states associated with the cleavage process are observed. The top states in the valence-band will transform into occupied interface states if the applied strain is large enough. The dependence of lattice trapping energies on applied load for cracks is determined. A type of flexible boundary condition is used in which outer atom positions are relaxed using an empirical interatomic potential, while inner atoms are treated ab-initio. The fractional range of loads K[sub max]/K[sub min] for lattice trapping is found to be 1.31 and the energy barrier to the advance of a straight crack line along [110] is found to be 0.24 eV/(surface atom). For the hydrogen embrittlement problem in silicon, the hydrogen atoms are found to channel along the [110] tunnel nearest and parallel to the crack line. Finally, the intrinsic stacking fault energy is found to be 106 erg/cm[sup 2] which is in close agreement to the results of others. The calculated defect state located at 0.128 eV above the valence-band maximum is also in good agreement with photoluminescence data.

Research Organization:
Arizona State Univ., Tempe, AZ (United States)
OSTI ID:
7102950
Resource Relation:
Other Information: Thesis (Ph.D.)
Country of Publication:
United States
Language:
English