skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Fundamental studies of grain boundary passivation in polycrystalline silicon with application to improved photovoltaic devices. Research report covering work completed from January-July 1980

Technical Report ·
OSTI ID:7017329

Calculations have been made of the a.c. properties of silicon grain boundaries based on the simple DDL/TE model. Experimental data obtained on bicrystals are shown to be in good agreement with these predictions. The anomalously large values of the low frequency capacitance are shown to be due to modulation of the barrier height by injected charge. Calculations of the properties of illuminated grain boundaries are also detailed and some preliminary conclusions are presented. Several new improved methods for the introduction of atomic hydrogen into polysilicon are discussed. By using EBIC characterization of polysilicon diodes it has been demonstrated that the hydrogen passivation process not only removes substantial amounts of trapped grain boundary charge, but also eliminates essentially all minority carrier recombination in these regions. Methods for reducing the hydrogen exposure time necessary to achieve this passivated condition are discussed.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
7017329
Report Number(s):
SAND-80-2461
Country of Publication:
United States
Language:
English