skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Extending the cutoff wavelength of lattice-matched GaInAsSb/GaSb thermophotovoltaic devices

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.57805· OSTI ID:701032

This paper reports the growth, materials characterization, and device performance of lattice-matched GaInAsSb/GaSb thermophotovoltaic (TPV) devices with cutoff wavelength extended from 2.3 to 2.5 {mu}m. GaInAsSb epilayers were grown lattice matched to GaSb substrates by organometallic vapor phase epitaxy using all organometallic precursors including triethylgallium, trimethylindium, tertiarybutylarsine, and trimethylantimony with diethyltellurium and dimethylzinc as the {ital n}- and {ital p}-type dopants, respectively. The growth temperature was 525&hthinsp;{degree}C. Although these alloys are metastable, a mirror-like surface morphology and room-temperature photoluminescence (PL) are obtained for alloys with PL peak emission at room temperature as long as 2.5 {mu}m. Lattice-matched GaInAsSb/GaSb TPV devices exhibit internal quantum efficiency as high as 90{percent} for devices with a cutoff wavelength of 2.5 {mu}m. The open circuit voltage for extended wavelength devices is 239 mV at 3.6 A/cm{sup 2}. {copyright} {ital 1999 American Institute of Physics.}

Sponsoring Organization:
USDOE
OSTI ID:
701032
Report Number(s):
CONF-981055-; ISSN 0094-243X; TRN: 9913M0007
Journal Information:
AIP Conference Proceedings, Vol. 460, Issue 1; Conference: 4. National Renewable Energy Laboratory (NREL) conference on thermophotovoltaic generation of electricity, Denver, CO (United States), 11-14 Oct 1998; Other Information: PBD: Mar 1999
Country of Publication:
United States
Language:
English