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Title: Gas-phase chemistry of the silaformyl anion, HSiO sup minus

Journal Article · · Journal of the American Chemical Society; (USA)
DOI:https://doi.org/10.1021/ja00159a016· OSTI ID:6946500
; ;  [1];  [2];  [3];  [4]
  1. Univ. of Colorado, Boulder (USA)
  2. Univ. of Adelaide (Australia)
  3. Institut fuer Organische Chemie der Technischen Universitaet Berlin (West Germany)
  4. Univ. of Colorado, Denver (USA)

The silaformyl anion, HSiO{sup {minus}}, has been prepared by collisionally induced dissociation (CID) of H{sub 3}SiO{sup {minus}} in a tandem flowing afterglow selected ion flow tube (FA-SIFT). The chemistry of the silaformyl anion has been studied in detail. Reactions with CO{sub 2}, COS, CS{sub 2}, SO{sub 2}, O{sub 2}, acetic acid, nitromethane, and hexafluorobenzene reveal a rich chemistry. For example, the sailaformyl anion reacts with CO{sub 2} by both an oxidative pathway giving HSiO{sub 2}{sup {minus}} and CO and a reductive path giving SiO and HCO{sub 2}{sup {minus}}. Typically, the silaformyl anion, which could have several sites of reactivity, behaves both as an oxygen nucleophile and as a hydride donor. Detailed mechanistic studies have been carried out on many of these reactions with isotopically labeled H{sup 29}SiO{sup {minus}} and HSi{sup 18}O{sup {minus}}. In addition to its reaction chemistry, the heat of formation of the silaformyl anion, its basicity, and the heat of formation of its parent compound have been estimated. Ab initio computations on the silaformyl anion have been carried out and demonstrate that HSiO{sup {minus}} is more than 40 kcal/mol more stable than HOSi{sup {minus}}.

OSTI ID:
6946500
Journal Information:
Journal of the American Chemical Society; (USA), Vol. 112:3; ISSN 0002-7863
Country of Publication:
United States
Language:
English