Development of polishing methods for Chemical Vapor Deposited Silicon Carbide mirrors for synchrotron radiation

Conference · Thu Jan 01 00:00:00 EST 1987

OSTI ID:6946415

Fuchs, B A; Brown, N J

Material properties of Chemical Vapor Deposited Silicon Carbide (CVD SiC) make it ideal for use in mirrors for synchrotron radiation experiments. We developed methods to grind and polish flat samples of CVD SiC down to measured surface roughness values as low as 1.1 Angstroms rms. We describe the processing details, including observations we made during trial runs with alternative processing recipes. We conclude that pitch polishing using progressively finer diamond abrasive, augmented with specific water based lubricants and additives, produces superior results. Using methods based on these results, a cylindrical and a toroidal mirror, each about 100 x 300mm, were respectively finished by Continental Optical and Frank Cooke, Incorporated. WYCO Interferometry shows these mirrors have surface roughness less than 5.7 Angstroms rms. These mirrors have been installed on the LLNL/UC X-ray Calibration and Standards Facility at the Stanford Synthrotron Radiation Laboratory.

• Research Organization: Lawrence Livermore National Lab., CA (USA)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6946415
• Report Number(s): UCRL-95882; CONF-8610113-2; ON: DE87005055
• Resource Relation: Conference: Workshop on optical fabrication and testing, Seattle, WA, USA, 21 Oct 1986; Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
MIRRORS
POLISHING
SILICON CARBIDES
CHEMICAL VAPOR DEPOSITION
SYNCHROTRON RADIATION
BREMSSTRAHLUNG
CARBIDES
CARBON COMPOUNDS
CHEMICAL COATING
DEPOSITION
ELECTROMAGNETIC RADIATION
RADIATIONS
SILICON COMPOUNDS
SURFACE COATING
SURFACE FINISHING
420200* - Engineering- Facilities
Equipment
& Techniques