Pulsed dye laser with grating and etalon in a symmetric arrangement
Journal Article
·
· Appl. Opt.; (United States)
Further improvements have been made to the grazing-incidence pulsed dye laser. Criteria have been established for inserting the intracavity etalon and for selecting the optimal blazed grating and its orders at grazing incidence. A new design is presented in which the grating and the etalon are arranged symmetrically. Single-mode operation and an output linewidth of the order of a few hundred megahertz (below 0.006A) have been obtained.
- Research Organization:
- Shanghai Institute of Laser Technology, Shanghai 200031, China
- OSTI ID:
- 6821679
- Journal Information:
- Appl. Opt.; (United States), Vol. 19:21
- Country of Publication:
- United States
- Language:
- English
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