Correlation of damage threshold and surface geometry of nodular defects in HR coatings as determined by in-situ atomic force microscopy
Atomic force microscopy (AFM) was used to determine in-situ the correlation between the surface dimensions of defects in dielectric multilayer optical coatings and their susceptibility to damage by pulsed laser illumination. The primary surface defects studied were [mu]m-scale domes associated with the classic nodule defect. The optical film studied was a highly reflective dielectric multilayer consisting of pairs of alternating HfO[sub 2] and SiO[sub 2] layers of quarter wave thickness at 1.06 [mu]m. Nodule defect height and width dimensions were measured prior to laser illumination on two different samples. Correlation between these dimensions supported a simple model for the defect geometry. Defects with high nodule heights ([gt] 0.6 [mu]m) were found to be most susceptible to laser damage over a range of fluences between 0-35 J/cm[sup 2] (1.06 [mu]m, 10 ns, and 1/e[sup 2] diam. of 1.3 mm). Crater defects, formed by nodules ejected from the coating prior to illumination, were also studied. None of the crater defects damaged when illuminated over the same range of fluences that the nodule defects were subjected to.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 6719820
- Report Number(s):
- UCRL-JC-111464; CONF-9210295-1; ON: DE93007509
- Resource Relation:
- Conference: SPIE symposium on Boulder damage, Boulder, CO (United States), 28-30 Oct 1992
- Country of Publication:
- United States
- Language:
- English
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Laser-damage susceptibility of nodular defects in dielectric mirror coatings: AFM measurements and electric-field modeling
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70 PLASMA PHYSICS AND FUSION TECHNOLOGY
REFLECTIVE COATINGS
PHYSICAL RADIATION EFFECTS
CORRELATIONS
DAMAGE
DEFECTS
HAFNIUM OXIDES
LASER RADIATION
MICROSCOPY
NEODYMIUM LASERS
SILICON OXIDES
THIN FILMS
CHALCOGENIDES
COATINGS
ELECTROMAGNETIC RADIATION
FILMS
HAFNIUM COMPOUNDS
LASERS
OXIDES
OXYGEN COMPOUNDS
RADIATION EFFECTS
RADIATIONS
REFRACTORY METAL COMPOUNDS
SILICON COMPOUNDS
SOLID STATE LASERS
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360206* - Ceramics
Cermets
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700411 - Inertial Confinement Devices- (1992-)