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Title: Gallium arsenide thin films on tungsten/graphite substrates: Phase II. Quarterly project report No. 3, March 1--May 31, 1978

Technical Report ·
OSTI ID:6567619

The objectives of this research are to investigate thin films of gallium arsenide on tungsten/graphite substrates and to prepare solar cells with an AM1 efficiency of 6 percent or higher by August 1978. Efforts during this quarter have been directed to (1) the effects of the nature of substrate on the initial stage of the deposition process, (2) the effects of the addition of hydrogen chloride to the reactant mixture, (3) the fabrication and characterization of thin film gallium arsenide solar cells on tungsten/graphite substrates with both gold and silver as barrier metals, and (4) the investigation of the temperature coefficients and stabilities of thin film gallium arsenide MOS solar cells. The use of the reaction between gallium, hydrogen chloride, and arsine in a hydrogen flow has been continued for the deposition of gallium arsenide. The initial stage of the deposition of gallium arsenide on graphite and carbon/graphite substrates and the effects of the addition of hydrogen chloride to the reactant mixture on the deposition of gallium arsenide on tungsten/graphite substrates have been investigated by scanning electron microscopy. The fabrication and characterization of thin film gallium arsenide MOS solar cells with gold or silver as the barrier metal were carried out. At present, the best cell of 9 cm/sup 2/ area has an AMl efficiency of 6.5 percent. The temperature coefficients of thin film gallium arsenide MOS solar cell characteristics were investigated. Some preliminary studies on the stability of this type of solar cells have been carried out.

Research Organization:
Southern Methodist Univ., Dallas, TX (USA)
DOE Contract Number:
EY-76-C-03-1284
OSTI ID:
6567619
Report Number(s):
SAN-1284-6
Country of Publication:
United States
Language:
English