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Title: Photochemical method for the separation of mixtures of xenon and krypton

Patent ·
OSTI ID:6564667

This invention relates generally to processes for the separation of noble gases and more specifically to processes for the separation of xenon from a gaseous mixture containing krypton. Fluorine is added to the mixture and the resulting mixture then irradiated with light of about 250-370 nm to form crystals of xenon difluoride. The unreacted gases are removed and the remaining crystals are decomposed, typically by thermal means, to yield xenon and fluorine gas. The xenon gas may be easily isolated by conventional means from the fluorine gas. Krypton may also be easily isolated from the remaining gases by conventional means. The process is particularly applicable to the treatment of off gases from a nuclear reactor or reprocessing plant.

Assignee:
EDB-84-168112
OSTI ID:
6564667
Country of Publication:
United States
Language:
English