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Title: Device-grade hydrogenated amorphous silicon produced by dc magnetron reactive sputtering

Technical Report ·
OSTI ID:6436407
 [1]
  1. Illinois Univ., Urbana, IL (USA)

The goal of this project is to determine the fundamental growth mechanisms of hydrogenated amorphous silicon (a-Si:H) and related alloys. This is important because thin films of these materials must have the high quality and stability required for 15%-efficient solar cells and be produced at high rates and low cost over large areas: achieving these requirements is more likely if the physics and chemistry governing film growth are understood. The complexity of growing the amorphous silicon-germanium allows layers needed for the low-bandgap portion of a tandem solar cell underscores the problem: Empirically optimizing this intricate process is not likely to succeed. This project proceeds in two stages: (1) produce state-of-the-art a Si:H using remote-source deposition methods, such as magnetron sputtering and remote-plasma glow discharge; and (2) analyze film growth kinetics using in-situ diagnostics, such as mass spectrometry, infrared adsorption spectroscopy, and spectroscopic ellipsometry. In the future this work will also encompass silicon-based alloys and serve to guide alloy optimization. This report details progress during the first project stage, in which we deposited device-grade a-Si:H using dc-magnetron reactive sputtering. We grew a-Si:H think films with 10--40 atom percent hydrogen, and determined their electronic properties and hydrogen bonding modes. Films containing up to 28 percent hydrogen were similar to state-of-the-art glow-discharge produced material suitable for solar cells. A key indicator of the material electronic quality is the mobility-recombination-lifetime product; we measured values for the minority-carrier holes as high as 1 {times} 10{sup {minus}8} cm{sup 2}/V, and for majority-carrier electrons up to 2 {times} 10{sup {minus}7} cm{sup 2}/V. 75 refs., 39 figs., 3 tabs.

Research Organization:
Electric Power Research Inst., Palo Alto, CA (USA); Illinois Univ., Urbana, IL (USA)
Sponsoring Organization:
EPRI
OSTI ID:
6436407
Report Number(s):
EPRI-GS-7012
Country of Publication:
United States
Language:
English