High rate reactive magnetron sputtered tungsten carbide films

Journal Article · Fri Nov 01 00:00:00 EST 1985 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.573266· OSTI ID:6343782

Srivastava, P K; Vankar, V D; Chopra, K L

Tungsten carbide films have been deposited on stainless steel substrates held between 300 to 500 /sup 0/C in a planar rf magnetron sputtering system at rates as high as that of pure tungsten (825 A/sup 0//min). The effect of substrate temperature on formation of WC/sub x/ films has been investigated. A mixture of hexagonal WC, A-15 W/sub 3/C and carbon in graphitic and diamond form have been observed by AES and XRD techniques. The microhardness of these films has been found to be as high as 2365 kgf/mm/sup 2/. The adhesion of these films as measured from indentation crack patterns has been found to depend on substrate temperature as well as on the amount of dispersed carbon in the film.

• Research Organization: Thin Film Laboratory, Department of Physics and Centre for Materials Science and Technology, Indian Institute of Technology, New Delhi-110016, India
• OSTI ID: 6343782
• Journal Information: J. Vac. Sci. Technol., A; (United States), Vol. 3:6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
STAINLESS STEELS
VAPOR DEPOSITED COATINGS
TUNGSTEN CARBIDES
CRYSTAL STRUCTURE
MECHANICAL PROPERTIES
SPUTTERING
TEMPERATURE EFFECTS
ADHESION
CHEMICAL COMPOSITION
CRACKS
HIGH TEMPERATURE
IMPURITIES
MICROHARDNESS
ALLOYS
CARBIDES
CARBON COMPOUNDS
CHROMIUM ALLOYS
COATINGS
CORROSION RESISTANT ALLOYS
HARDNESS
IRON ALLOYS
IRON BASE ALLOYS
REFRACTORY METAL COMPOUNDS
STEELS
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360203 - Ceramics
Cermets
& Refractories- Mechanical Properties