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Title: Removal of the chlorofluorocarbon 1,1,2-trichloro-1,2,2-trifluoroethane in gas by a corona-discharge reactor

Journal Article · · Industrial and Engineering Chemistry Research
DOI:https://doi.org/10.1021/ie970615d· OSTI ID:624327
; ;  [1]
  1. Kyoto Univ. (Japan). Dept. of Chemical Engineering

Two types of corona-discharge reactors, a deposition-type reactor in which negative ions deposit at the anode and a wetted-wall reactor in which negative ions are absorbed into a liquid film on the anode, are applied to removals of C{sub 2}F{sub 3}Cl{sub 3}. By the deposition-type reactor, the removal efficiency from N{sub 2} increases with the decrease of the inlet concentration, suggesting that this reactor can be applied to remove extremely low concentrations of C{sub 2}F{sub 3}Cl{sub 3}. When the C{sub 2}F{sub 3}Cl{sub 3} concentration is high, there is an optimum concentration of coexisting H{sub 2}O to give the maximum removal efficiency. When O{sub 2} is mixed, the removal efficiency decreases. The removal mechanism is discussed on the basis of dissociative electron attachment, radical reaction, and particle formation. When the C{sub 2}F{sub 3}Cl{sub 3} concentration is high, the wetted-wall reactor shows a higher removal efficiency than the deposition-type reactor. On the other hand, when the C{sub 2}F{sub 3}Cl{sub 3} concentration is low, the result is opposite.

Sponsoring Organization:
USDOE
OSTI ID:
624327
Journal Information:
Industrial and Engineering Chemistry Research, Vol. 37, Issue 4; Other Information: PBD: Apr 1998
Country of Publication:
United States
Language:
English