Diamond film growth on Ti-implanted glassy carbon

Journal Article · Mon Sep 20 00:00:00 EDT 1993 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.110718· OSTI ID:6219962

Brewer, M A; Brown, I G ^[1]; Evans, P J; Hoffman, A ^[2]

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1. Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (United States)
2. Applications of Nuclear Physics, Ansto, PMB1, Menai NSW 2234 (Australia)

The growth of diamond thin films on glassy carbon substrates has been investigated as a function of deposition time for different surface treatments. Implantation of Ti to a dose of 1.7[times]10[sup 17] cm[sup [minus]2] and abrasion with diamond powder have both been examined to determine their effect on film nucleation and growth. At the shorter deposition times studied, diamond nucleation was observed on all test samples with those subjected to the abrasive pretreatment exhibiting the higher growth rates. However, the adhesion and uniformity of films on unimplanted glassy carbon were found to deteriorate significantly following deposition runs of 14 and 21 h duration. This was attributed to a destabilization of the underlying surface caused by plasma erosion.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 6219962
• Journal Information: Applied Physics Letters; (United States), Vol. 63:12; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DIAMONDS
DEPOSITION
ABRASION
CRYSTAL GROWTH METHODS
ION IMPLANTATION
NUCLEATION
SURFACE TREATMENTS
TITANIUM IONS
CARBON
CHARGED PARTICLES
ELEMENTAL MINERALS
ELEMENTS
IONS
MINERALS
NONMETALS
360601* - Other Materials- Preparation & Manufacture