skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Radiation degradation behavior of chlorine-containing vinyl copolymers. Search for improved electron-beam resists

Journal Article · · Polym. Eng. Sci.; (United States)
 [1]; ; ;
  1. Army Electronics Tech. and Devices Lab., Fort Monmouth, NJ

Vinyl copolymers with high radiation degradation sensitivity have been synthesized by copolymerizing vinylidene chloride (VDC), CH/sub 2/ = CCl/sub 2/, with methyl methacrylate (MMA), methacrylonitrile, methyl ..cap alpha..-chloroacrylate, and dimethyl itaconate using emulsion techniques. In addition, copolymers of methyl ..cap alpha..-chloroacrylate with methyl methacrylate and poly(..cap alpha..-chloroacrylonitrile) were studied. Introduction of vinylidene chloride into methyl methacrylate polymers caused a sharp increase in G/sub s/ even at relatively low VDC incorporation. Upon 29% VDC incorporation, the G/sub s/ value increased from 1.3 (homopolymer of MMA) to 3.4. G/sub s/ was found to be a linear function of copolymer content for several systems, but G/sub x/ was not. At higher VDC levels, the increase in G/sub s/ was countered by increases in G/sub x/. At lower VDC levels, G/sub x/ was suppressed below the values predicted by a linear G/sub x/ dependence on composition for such systems as VDC/MMA, MCA/MMA, and ..cap alpha..-chloroacrylonitrile/MMA. The VDC/MMA copolymer (29% VDC) gave a sensitivity of 4.0 x 10/sup -5/ C/cm/sup 2/ to electron beam exposure using the 0% unexposed resist thickness loss criterion and is 2 to 3 times more sensitive than PMMA. Poly(..cap alpha..-chloroacrylonitrile) is a negative resist with a sensitivity of 5 x 10/sup -5/ C/cm/sup 2/ using one-micron line images for testing.

OSTI ID:
6197826
Journal Information:
Polym. Eng. Sci.; (United States), Vol. 20:9
Country of Publication:
United States
Language:
English

Similar Records

Radiation degradation of methyl. cap alpha. -chloroacrylate-methacrylonitrile copolymers. [Gamma rays]
Journal Article · Tue Jan 01 00:00:00 EST 1980 · J. Polym. Sci., Polym. Chem. Ed.; (United States) · OSTI ID:6197826

Synthesis and radiation degradation of vinyl polymers with fluorine: search for improved lithographic resists. [Gamma rays]
Journal Article · Mon Dec 01 00:00:00 EST 1980 · J. Polym. Sci., Polym. Chem. Ed.; (United States) · OSTI ID:6197826

Electron-sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl. cap alpha. -chloroacrylate, and hexyl methacrylate. [Electron beam irradiation]
Journal Article · Sun Jan 01 00:00:00 EST 1978 · J. Appl. Polym. Sci.; (United States) · OSTI ID:6197826