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Title: Extreme critical-temperature enhancement of Al by tunneling in Nb/AlO sub x /Al/AlO sub x /Nb tunnel junctions

Journal Article · · Physical Review Letters; (USA)
; ;  [1];  [2]
  1. Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, United Kingdom (GB)
  2. Department of Applied Physics, University of Groningen, Nijenborgh 18, 9747 AG Groningen, The Netherlands (NL)

High-conductance Nb/AlO{sub {ital x}}/Al/AlO{sub {ital x}}/Nb tunnel-junction devices with the Al thickness varying from 3 to 20 nm have been fabricated using a whole-wafer processing route. Current-voltage measurements show a step in the subgap structure corresponding to the difference in the energy gaps {ital V}=2({Delta}{sub Nb}{minus}{Delta}{sub Al}) of the two superconductors. The measured {Delta}{sub Al} is large and persists to temperatures considerably in excess of the equilibrium critical temperature of the Al. This is interpreted as arising from a tunnel-induced gap enhancement which is an order of magnitude larger than has been seen previously.

OSTI ID:
6118706
Journal Information:
Physical Review Letters; (USA), Vol. 66:2; ISSN 0031-9007
Country of Publication:
United States
Language:
English