Microstructural development in Si sub 3 N sub 4 /polysilazane bodies during heating

Journal Article · Fri Jul 01 00:00:00 EDT 1988 · Advanced Ceramic Materials; (USA)

DOI:https://doi.org/10.1111/j.1551-2916.1988.tb00226.x· OSTI ID:6108913

Schwartz, K B; Rowcliffe, D J; Blum, Y D ^[1]

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1. SRI International, Menlo Park, CA (USA)

The development of microstructure during heating has been investigated for molded Si{sub 3}N{sub 4} bodies fabricated with commercial {alpha}-Si{sub 3}N{sub 4} powder and a preceramic polysilazane binder. After the N-methyl polysilazane binder is pyrolyzed at 800{degree}C under N{sub 2}, the bodies have a uniform microstructure composed of an intimate mixture of Si{sub 3}N{sub 4} particles and polysilazane-derived amorphous silicon nitride. After the particles undergo high-temperature treatment at 1,725{degree}C in an N{sub 2} overpressure of {approx} 700 kPa, significant grain growth occurs. SEM and microhardness data suggest local densification in the body and high reactivity for the polysilazane-derived silicon nitride.

• OSTI ID: 6108913
• Journal Information: Advanced Ceramic Materials; (USA), Vol. 3:4; ISSN 0883-5551
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SILICON NITRIDES
FABRICATION
MICROSTRUCTURE
BINDERS
EXPERIMENTAL DATA
HIGH TEMPERATURE
MEASURING INSTRUMENTS
MEASURING METHODS
CRYSTAL STRUCTURE
DATA
INFORMATION
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
PNICTIDES
SILICON COMPOUNDS
360202* - Ceramics
Cermets
& Refractories- Structure & Phase Studies
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication