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Title: p-buffer layer dependent drift mobility profiles in GaAs metal-semiconductor field-effect transistors

Conference · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
OSTI ID:6071029

Mobility profiles in WN{sub x}-LDD (lightly doped drain region) and WN{sub x}-BPLDD (buried p-type buffer lightly doped drain region) GaAs metal-semiconductor field-effect transistor (MESFET) with various p-buffer layers are discussed. The mobility profiles are evaluated using frequency dependent admittance studies. A slightly doped p-buffer layer seems to have no influence on the carrier concentration while there is a significant modification of the mobility profile at lower gate voltages. The channel drift mobility in BPLDD-MESFETs with heavily implanted p-buffer layers is degraded over the whole gate voltage swing. Mg-p-type implants have no effect on the carrier profile near its peak while the tail region is shifted to higher gate voltages. However, to observe a significant sharpening of the channel electron concentration profile a certain amount of Mg implantation dose seems to be necessary.

OSTI ID:
6071029
Report Number(s):
CONF-9009402-; CODEN: JVTBD
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 9:2; Conference: Workshop on high-density plasma techniques and processes for integrated circuit fabrication, Burlingame, CA (United States), 11-12 Sep 1990; ISSN 0734-211X
Country of Publication:
United States
Language:
English