Etching of tungsten with XeF/sub 2/: An x-ray photoelectron spectroscopy study
In situ x-ray photoelectron spectroscopy measurements of both W(100) crystals and sputter-deposited tungsten films exposed to a molecular beam of XeF/sub 2/ with and without an accompanying argon ion beam have yielded the fluorine coverage and the chemical states of the adsorbed fluorine as a function of temperature, exposure, and ion dose. WF, WF/sub 2/, WF/sub 3/, and WF/sub 4/ were found to exist on the tungsten surfaces. Room and elevated temperature exposures of clean tungsten resulted in the surface population of mainly WF species with WF/sub 4/ observed on nonannealed samples. Ion dose promoted the formation of higher fluorine coordination species from the WF leading to the formation of volatile WF/sub 6/ and thus resulting in ion-enhanced etching of tungsten.
- Research Organization:
- Department of Physics, University of Houston, Houston, Texas 77004
- OSTI ID:
- 6000348
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 62:11
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
FLUORINE
ADSORPTION
TUNGSTEN
ETCHING
MOLECULE COLLISIONS
SORPTIVE PROPERTIES
XENON FLUORIDES
COLLISIONS
ELECTRONIC STRUCTURE
PHOTOELECTRON SPECTROSCOPY
SPUTTERING
TUNGSTEN FLUORIDES
ELECTRON SPECTROSCOPY
ELEMENTS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
METALS
NONMETALS
RARE GAS COMPOUNDS
REFRACTORY METAL COMPOUNDS
SORPTION
SPECTROSCOPY
SURFACE FINISHING
SURFACE PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN COMPOUNDS
XENON COMPOUNDS
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
360101 - Metals & Alloys- Preparation & Fabrication