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Title: Preparation of 1. 78-. mu. m wavelength Al/sub 0. 2/Ga/sub 0. 8/Sb/GaSb double-heterostructure lasers by molecular beam epitaxy

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94132· OSTI ID:5862187

As the losses due to Rayleigh scattering decrease at a rate of lambda/sup 4/ with increasing wavelength lambda, the future generation of optical fibers, light sources, and detectors may well be operating at still longer wavelength beyond 1.55 ..mu..m. The present letter reports the first preparation of Al/sub 0.2/Ga/sub 0.8/Sb/GaSb double-heterostructure (DH) lasers by molecular beam epitaxy (MBE) operating at 1.78 ..mu..m. For Al/sub x/Ga/sub 1-x/Sb with x< or approx. =0.1, room-temperature photoluminescent intensity and linewidth similar to those of bulk GaSb substrate of similar carrier concentration were obtained. The Al/sub 0.2/Ga/sub 0.8/Sb/GaSb DH laser wafers grown by MBE have smooth, featureless, mirror-reflecting surfaces. Reflection high-energy electron diffraction study shows that the abrupt Al/sub 0.2/Ga/sub 0.8/Sb/GaSb interfaces were atomically smooth. Initial threshold current measurements gave a pulsed threshold current density of 3.4 kA/cm/sup 2/ for a diode of 380 x 200 ..mu..m and an active GaSb layer of 0.33 ..mu..m.

Research Organization:
Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
5862187
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 43:1
Country of Publication:
United States
Language:
English