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Title: Ion bombardment effects on the near-surface composition during sputter profiling. [Cu-40 at. % Ni; Ni-9. 5 at. % Si]

Conference ·
OSTI ID:5848979

The alteration of the near-surface composition that has often been observed in ion-bombarded alloys and compounds results from the interplay of several processes. In addition to displacement mixing leading to a randomization of atomic locations, and preferential loss of alloying elements by sputtering, which are dominant at relatively low temperatures, many thermally-activated processes, including radiation-enhanced diffusion, radiation-induced segregation and Gibbsian adsorption, also play important roles. The relative significance of each process in the evolution of the sputtered flux composition and of the compositional profile of the target depends on the type of alloys, temperature and ion characteristics. The number of systematic investigations of alloy sputtering that consider all of these processes and their potential interactions is rather limited. Purpose of this paper is to characterize the processes in simple physical terms and to point out under what conditions they may become important for compositional changes in near-surface regions of sputter alloys. Selected results of recent model calculations and experimental studies will be presented to indicate the effects to be expected. 63 refs., 15 figs.

Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
5848979
Report Number(s):
CONF-8710213-1; ON: DE88003087
Resource Relation:
Conference: European conference on applications of surface and interface analysis, Fellbach, F.R. Germany, 19 Oct 1987; Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English