Formation, decomposition, and electrical transport properties of amorphous Hf-Ni and Hf-Co alloys
Amorphous Hf/sub 1-x/Ni/sub x/ and Hf/sub 1-x/Co/sub x/ alloys in the concentration range 0.2< or =x< or =0.9 were prepared by melt spinning. The crystallization behavior of these alloys was studied by means of differential scanning calorimetry and x-ray diffraction. At least two new compounds in the Hf-Ni system were observed to be formed upon crystallization of the amorphous alloys. The electrical resistivity (rho) in the amorphous alloys and in crystalline HfNi/sub 5/ was studied in the range from 4.2 to 300 K. Negative temperature dependences of rho were observed in several of the amorphous alloys, extending from x=0.25 to x=0.65 in Hf/sub 1-x/Ni/sub x/. The thermal stability of the amorphous alloys is discussed in terms of a diffusion mechanism. The extended Ziman theory of liquid metals was used in the interpretation of the temperature dependence of the resistivity.
- Research Organization:
- Philips Research Laboratories, Eindhoven, The Netherlands
- OSTI ID:
- 5836604
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 50:10
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
COBALT ALLOYS
ELECTRICAL PROPERTIES
SYNTHESIS
HAFNIUM ALLOYS
NICKEL ALLOYS
AMORPHOUS STATE
CALORIMETRY
CRYSTALLIZATION
DECOMPOSITION
QUANTITY RATIO
X-RAY DIFFRACTION
ALLOYS
CHEMICAL REACTIONS
COHERENT SCATTERING
DIFFRACTION
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
SCATTERING
360104* - Metals & Alloys- Physical Properties
360102 - Metals & Alloys- Structure & Phase Studies