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Title: Formation, decomposition, and electrical transport properties of amorphous Hf-Ni and Hf-Co alloys

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.325724· OSTI ID:5836604

Amorphous Hf/sub 1-x/Ni/sub x/ and Hf/sub 1-x/Co/sub x/ alloys in the concentration range 0.2< or =x< or =0.9 were prepared by melt spinning. The crystallization behavior of these alloys was studied by means of differential scanning calorimetry and x-ray diffraction. At least two new compounds in the Hf-Ni system were observed to be formed upon crystallization of the amorphous alloys. The electrical resistivity (rho) in the amorphous alloys and in crystalline HfNi/sub 5/ was studied in the range from 4.2 to 300 K. Negative temperature dependences of rho were observed in several of the amorphous alloys, extending from x=0.25 to x=0.65 in Hf/sub 1-x/Ni/sub x/. The thermal stability of the amorphous alloys is discussed in terms of a diffusion mechanism. The extended Ziman theory of liquid metals was used in the interpretation of the temperature dependence of the resistivity.

Research Organization:
Philips Research Laboratories, Eindhoven, The Netherlands
OSTI ID:
5836604
Journal Information:
J. Appl. Phys.; (United States), Vol. 50:10
Country of Publication:
United States
Language:
English