Images of a microelectronic device with the X1-SPEM, a first generation scanning photoemission microscope at the National Synchrotron Light Source

Journal Article · Wed May 01 00:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.577541· OSTI ID:5677383

Ade, H; Kirz, J ^[1]; Hulbert, S; Johnson, E ^[2]; Anderson, E ^[3]; Kern, D ^[4]

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1. Department of Physics, State University of New York, Stony Brook, New York 11794 (USA)
2. NSLS, Brookhaven National Laboratory, Upton, New York 11973 (USA)
3. Center for X-Ray Optics, LBL, Berkeley, California 94720 (USA)
4. T. J. Watson Research Center, IBM, Yorktown Heights, New York 10593 (USA)

We have recently completed the first generation scanning photoemission microscope at beamline X1A at the National Synchrotron Light Source (NSLS), the X1-SPEM. The instrument is designed to use the soft x-ray undulator at the NSLS as a high brightness source to illuminate a Fresnel zone plate, thus forming a finely focused probe, {le}0.4 {mu}m in size, on the specimen surface. A grating monochromator selects the photon energy in the 400--800 eV range with an energy resolution of 0.8--2 eV. The flux in the zone plate focus is in the 10{sup 8}--10{sup 9} photons/s range. A single pass cylindrical mirror analyzer (CMA) is used to record photoemission spectra, or to form an image within a fixed electron energy bandwidth as the specimen is mechanically scanned. The best one-dimensional resolution achieved so far is 0.1 {mu}m, as judged by the 25%--75% intensity rise across an edge. This is close to the diffraction limit of the zone plate used. Due to astigmatism introduced by the beamline optics, the two-dimensional resolution in the plane of least confusion is presently limited to 0.4 {mu}m. Images of a microelectronic device are presented, along with some representative spectra, to demonstrate the present capabilities. With an upgrade of the beamline optics, and a new generation of zone plates, the two-dimensional spatial resolution in a second generation instrument is anticipated to be about 50 nm.

• DOE Contract Number: AC02-76CH00016; AC03-76SF00098
• OSTI ID: 5677383
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Vol. 9:3; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION
MICROSCOPES
SOFT X RADIATION
ENERGY RESOLUTION
MICROSCOPY
MONOCHROMATORS
NSLS
ACCELERATORS
CYCLIC ACCELERATORS
ELECTROMAGNETIC RADIATION
IONIZING RADIATIONS
RADIATION SOURCES
RADIATIONS
RESOLUTION
SYNCHROTRON RADIATION SOURCES
SYNCHROTRONS
X RADIATION
440800* - Miscellaneous Instrumentation- (1990-)