skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Synthesis of dilute magnetic semiconductors by ion implantation. [CdMnTe synthesis]

Conference ·
OSTI ID:5659946

We have synthesized layers of CdMnTe by implantation of Mn into CdTe. Samples of CdTe have been implanted with Mn ions of 60 keV energy to fluences in the range 1 x 10/sup 13/ cm/sup -2/ to 2 x 10/sup 16/ cm/sup -2/ resulting in local concentrations of up to 10% at the maximum of the Mn distribution. Rutherford backscattering-channeling analysis has been used to study the radiation damage after implantation and after subsequent rapid thermal annealing (RTA). These experiments reveal that RTA for 15 sec at a temperature T greater than or equal to 700/sup 0/C results in the complete recovery of the lattice order, without affecting the stoichiometry of CdTe. Photoluminescence (PL) measurements of a sample showing complete annealing reveal an increase in the band gap corresponding to the synthesis of very dilute (x approx. = 0.004) Cd/sub 1-x/Mn/sub x/Te. A shift of the excitonic PL peak to lower energies is observed when a magnetic field H less than or equal to 1T is applied. These measurements provide clear evidence for the synthesis of a DMS by ion implantation of Mn into CdTe.

Research Organization:
Massachusetts Inst. of Tech., Cambridge (USA); Oak Ridge National Lab., TN (USA)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
5659946
Report Number(s):
CONF-8606101-3; ON: DE86013263
Resource Relation:
Conference: 5. international conference on ion beam modification of materials, Catania, Italy, 9 Jun 1986
Country of Publication:
United States
Language:
English