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Title: Thin film network test pattern for use with electroplated gold

Conference ·
OSTI ID:5582180

A test pattern was developed to monitor the quality of pattern electroplated gold thin-film networks (TFNs). A Ti/Pd/pattern electroplated Au metallization system is replacing the current Bendix Kansas City production evaporated Cr/Au system. The monitor retains the most useful features of its predecessor and adds several new patterns for the electrical measurement of resolution, gold thickness, and conductor width. Each 0.25 by 1 in. monitor contains standard and checkerboard thermal compression lead frame bond pads and 18 electrical test patterns. Pattern electroplating was used to make a conductor for 4-point resistance measurements on the monitor and a microcomputer based tester is being assembled to measure and reduce the resistance data.

Research Organization:
Bendix Corp., Kansas City, MO (USA)
DOE Contract Number:
AC04-76DP00613
OSTI ID:
5582180
Report Number(s):
BDX-613-2712; CONF-820214-1; ON: DE82010728
Resource Relation:
Conference: 9. plating in electronic industry symposium, Atlanta, GA, USA, 16 Feb 1982
Country of Publication:
United States
Language:
English