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Title: Deposition of high quality YBa sub 2 Cu sub 3 O sub 7 minus. delta. thin films over large areas by pulsed laser ablation with substrate scanning

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.347611· OSTI ID:5562286
;  [1]; ;  [2]; ; ; ;  [1];  [2]
  1. Department of Electrical Engineering, Texas Center for Superconductivity, University of Houston, Houston, Texas 77204-4793 (USA)
  2. Department of Chemical Engineering, Texas Center for Superconductivity, University of Houston, Houston, Texas 77204-4793 (USA)

We describe the transport and structural properties of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} thin films deposited by pulsed laser ablation with computer-controlled substrate scanning. Films were deposited on LaAlO{sub 3} and SrTiO{sub 3} substrates covering a 2{times}3 cm area with thicknesses of 90 and 160 nm. The 90-nm thick films exhibited a thickness variation of {plus minus}8%, {ital T}{sub co} = 90.7 {plus minus} 0.5 K, {ital J}{sub {ital c}} = 4.8 {plus minus} 0.2 {times} 10{sup 6} A/cm{sup 2} at 77 K, and a surface resistance (corrected for finite thickness) at 75 GHz of 10--12 m{Omega} at 77 K. For the 160-nm thick films, the thickness variation was {lt}5%, {ital T}{sub co} = 91.0 {plus minus} 0.3 K, {ital J}{sub {ital c}}=5.4{plus minus}0.4{times}10{sup 6} A/cm{sup 2}, and corrected surface resistance was 6--10 m{Omega}. X-ray diffraction showed that the {ital c}-axis mosaic in the films is closely related to that of the substrates and that the only in-plane defects are due to the expected twinning in the {ital a}-{ital b} plane of the film. The {ital c}-axis lattice constants were 1.1688{plus minus}0.0004 nm. The above properties showed a high degree of uniformity across the substrate area and between films from different deposition cycles. The surface resistance values add significantly to the body of results which show that the temperature-scaled values for niobium can be equaled and perhaps surpassed by YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}}.

OSTI ID:
5562286
Journal Information:
Journal of Applied Physics; (USA), Vol. 69:10; ISSN 0021-8979
Country of Publication:
United States
Language:
English