Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment

Journal Article · Mon Jun 10 00:00:00 EDT 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.104835· OSTI ID:5481535

Kloidt, A; Nolting, K; Kleineberg, U; Schmiedeskamp, B; Heinzmann, U ^[1]; Mueller, P; Kuehne, M ^[2]

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1. Universitaet Bielefeld, Fakultaet fuer Physik, D-4800 Bielefeld 1, Germany (DE)
2. Physikalisch-Technische Bundesanstalt, Institut Berlin, D-1000 Berlin 33, Germany (DE)

Thermal treatment of a Mo/Si multilayer stack enhances its reflectivity in the soft x-ray region. The multilayer x-ray mirrors are fabricated by electron beam evaporation in ultrahigh vacuum. {ital In} {ital situ} measurement of the reflectivity during the deposition allows thickness control and an observation of changes in quality of the boundaries. By heating the substrates during deposition we obtain a smoothing of the interfaces. This leads to x-ray mirrors with peak reflectivity around 50% for normal incident radiation of wavelengths between 130 and 140 A.

• OSTI ID: 5481535
• Journal Information: Applied Physics Letters; (United States), Vol. 58:23; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION
MIRRORS
REFLECTIVITY
REFLECTIVE COATINGS
FABRICATION
HEAT TREATMENTS
MOLYBDENUM
SILICON
SOFT X RADIATION
X-RAY EQUIPMENT
COATINGS
ELECTROMAGNETIC RADIATION
ELEMENTS
EQUIPMENT
IONIZING RADIATIONS
METALS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SEMIMETALS
SURFACE PROPERTIES
TRANSITION ELEMENTS
X RADIATION
440800* - Miscellaneous Instrumentation- (1990-)