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Title: Electron and hole transport in a-italic-Si/sub 1-//sub x-italic/Ge/sub x-italic/:H alloys

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.337203· OSTI ID:5398497

Amorphous Si/sub 1-//sub x-italic/Ge/sub x-italic/:H films and p-italic-i-italic-n-italic diodes were fabricated by decomposition of SiH/sub 4//GeH/sub 4/ mixtures in a triode glow-discharge reactor. The photoconductivity under AM1 illumination in these alloys was constant over a range of band gaps between 1.8 (x-italic = 0) and 1.5 eV (x-italic = 0.25), while the solar cell conversion efficiency decreased at the same time from 8.6% to 4.3%. This can be explained by a reduction in the ..mu..tau product for holes with rising x-italic in undoped samples as revealed by time-of-flight experiments. In contrast to ..mu..tau, the hole drift mobility ..mu../sub D-italic//sub ,//sub h-italic/ remains constant. The opposite behavior is observed for electrons, whose drift mobility ..mu../sub D-italic//sub ,//sub e-italic/ decreases as the mobility activation energy E-italic/sub A-italic/ increases. The relation between E-italic/sub A-italic/ and ..mu../sub D-italic//sub ,//sub e-italic/ for variable x-italic is suggestive of the Meyer--Neldel rule for the conductivity. In conjunction with space-charge-limited current and sub-band-gap absorption data we conclude that only the conduction-band tail is widened by the incorporation of Ge while the valence-band tail remains unaffected. The transport data for x-italic>0 can no longer be explained by a purely exponential conduction-band tail. The rising density of midgap states shows an increasing capture cross section for holes and a decreasing one for electrons.

Research Organization:
Siemens Research Laboratories, Otto-Hahn-Ring 6, 8000 Muenchen 83, Federal Republic of Germany
OSTI ID:
5398497
Journal Information:
J. Appl. Phys.; (United States), Vol. 60:6
Country of Publication:
United States
Language:
English