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Title: Susceptibility of Si:P across the metal-insulator transition. I. Diamagnetism

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)

We have made static susceptibility measurements at temperatures between 1.25 and 300 K on samples of phosphorus-doped silicon with dopant concentrations in the range 0.2<1.3, where n/sub c/ is the critical concentration for the metal-insulator transition. In this paper we discuss our results for the diamagnetism associated with the donor electrons. We find that the donor susceptibility above 60 K is diamagnetic and varies linearly with concentration. We associate the susceptibility observed at these temperatures with a diamagnetic term, chi/sub D/(T,n), which is of the Landau-Peierls-Pauli type, but which is linear in n. Using static susceptibility data at higher concentrations obtained by other investigators, we show that the linear behavior of chi/sub D/ persists up to approx.3n/sub c/, i.e., within the entire impurity-''band'' region, beyond which it reverts to the n/sup 1/3/ behavior expected for a standard band. We find that published ESR susceptibility data for similar concentrations exhibit the same concentration dependence as chi/sub D/. Use of the ESR data has enabled us to separate out the orbital and spin contributions to the susceptibility. The average diamagnetic susceptibility per donor is found to agree with calculated values of the Larmor diamagnetism of localized electrons, and is independent of concentration over a range spanning the transition from insulating to metallic behavior; so far as the average orbital contribution of the donor electrons in the impurity ''band'' is concerned, it makes little difference whether the electrons are in localized or extended states.

Research Organization:
Department of Physics, City College of the City University of New York, New York, New York 10031
OSTI ID:
5310965
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Vol. 37:10
Country of Publication:
United States
Language:
English