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Title: (111) random and <110> channeled implantation profiles and range parameters in Hg/sub 1/. sqrt. /sub x/Cd/sub x/Te

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.340394· OSTI ID:5253046

We have measured, using secondary-ion mass spectrometry, the (111) random and <110> channeled profiles for about 45 ions implanted into Hg/sub 1/..sqrt../sub x/Cd/sub x/Te. Ion energies vary from 100 to 700 keV, and ion fluences from 1 x 10/sup 13/ to 3 x 10/sup 15/ cm/sup -2/. The specially preannealed device-quality Hg/sub 1/..sqrt../sub x/Cd/sub x/Te substrates were implanted at room temperature and not annealed after implantation. Ions implanted include /sup 1/H(C), /sup 2/H(C), He, Li(C), Be(C), B(C), C(C), N(C), O(C), F(C), Na(C), Mg(C), Al(C), Si(C), P(C), S(C), Cl(C), K(C), Ca(C), Ti(C), V, Cr(C), Mn(C), Fe(C), Co(C), Ni, Cu(C), Zn, Ga, Ge, As, Se, Br(C), Kr, Rb, Zr, Mo(C), Ag, In(C), Sn, Sb, Cs, and Ta, where (C) means that <110> channeled profiles were measured in addition to (111) random orientation profiles. Other ions were implanted but with poor profiling results. We report here implantation range data that include the peak depth R/sub m/, the projected range R/sub p/ or first moment ..mu.., the range straggle ..delta..R/sub p/ or second moment sigma, the third moment or skewness ..gamma../sub 1/, and the fourth moment or kurtosis ..beta../sub 2/, obtained from a Pearson IV fitting routine, and the maximum <110> channeling range. We show what densities and depths can be achieved using <110> channeled implantation in solid-state recrystallized Hg/sub 1/..sqrt../sub x/Cd/sub x/Te. Values of electronic stopping S/sub e/ are calculated from the maximum <110>channeling ranges and show the Z/sub 1/-dependent nature of S/sub e/.

Research Organization:
Hughes Research Laboratories, Malibu, California 90265
OSTI ID:
5253046
Journal Information:
J. Appl. Phys.; (United States), Vol. 63:11
Country of Publication:
United States
Language:
English