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Title: Thin-film polycrystalline silicon solar cells. Technical progress quarterly report No. 3, 25 March 1980-24 June 1980

Technical Report ·
OSTI ID:5232723

Thirty-four new solar cells were fabricated on Wacker Silso substrates and the AM-1 parameters were measured. A detailed comparison was made between the measurement of minority carrier diffusion length by the QE method and the penetrating-light laser-scan grain-boundary photoresponse linewidth method. The laser scan method has more experimental uncertainty and agrees within 10 to 50% with the QE method. It allows determination of L over a large area. Atomic hydrogen-passivation studies continued on Wacker material by three techniques. A method of determining surface recombination velocity, s, from laser scan data was developed. No change in s in completed solar cells after H-plasma treatment was observed within experimental error. H-passivation of bare silicon bars as measured by the new laser scan - photoconductivity technique showed very large effects. This method measures majority carrier effects which are sensitive to changes in GB barrier heights. Finally, H-passivation was studied in silicon-ITO heterojunction structures so that a phosphorus diffusion step was not necessary to observe minority carrier effects. Preliminary results showed a 50% reduction in s from 1.8 x 10/sup 5/ cm/s to 1.2 x 10/sup 5/ cm/s. However, both values are higher than what is observed in phosphorus-diffused cells, i.e., s = 7 x 10/sup 3/ cm/s. Laser scans and QE measurements were carried out on three low-cost substrates: Crystal Systems cast silicon, Mobil-Tyco ribbon, and RCA epitaxial layer on Dow metallurgical grade substrate. Etching studies were initiated to observe dislocations and stacking faults in polycrystalline silicon.

Research Organization:
RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
5232723
Report Number(s):
SERI/PR-0-8276-3
Country of Publication:
United States
Language:
English